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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 3, 2002, Pages 1008-1012

Freestanding microheaters in Si with high aspect ratio microstructures

(2) Tian, W C a Pang, S W a

a UNIVERSITY OF MICHIGAN (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORBENTS; ASPECT RATIO; CRYSTAL MICROSTRUCTURE; DRY ETCHING; GAS CHROMATOGRAPHY; HEATING; MICROMACHINING; OPTIMIZATION; PASSIVATION; POWER CONTROL; PRINTED CIRCUIT BOARDS; REACTIVE ION ETCHING; SILICON WAFERS; STRENGTH OF MATERIALS; THERMAL CONDUCTIVITY OF SOLIDS; THERMAL EFFECTS;

THICK MICROHEATERS;

SEMICONDUCTING SILICON;

EID: 0035998530 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: 10.1116/1.1479363 Document Type: Conference Paper

Times cited : (15)

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