Thick oxidised porous silicon layer as a thermo-insulating membrane for high-temperature operating thin- and thick-film gas sensors

Sensors and Actuators, B: Chemical

Volumn 49, Issue 1-2, 1998, Pages 22-29

  Maccagnani, P ^a   Angelucci, R ^a,b   Pozzi, P ^a   Poggi, A ^a   Dori, L ^a,b   Cardinali, G C ^a   Negrini, P ^a,c  

^a CNR   (Italy)

^b IBM T J WATSON RESEARCH CENTER   (United States)

^c STMICROELECTRONICS   (Italy)

Author keywords

Dielectric membranes; Gas sensor; Porous silicon; Porous silicon oxidation

Indexed keywords

ANODIC OXIDATION; ENERGY DISPERSIVE SPECTROSCOPY; MORPHOLOGY; POROUS SILICON; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; STOICHIOMETRY; THERMAL INSULATING MATERIALS; THERMOOXIDATION; THICK FILMS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

DIELECTRIC MEMBRANES; PHOSPHORUS IMPLANTATION;

CHEMICAL SENSORS;

EID: 0032091511     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-4005(97)00337-7     Document Type: Article

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