Dry etching of Si field emitters and high aspect ratio resonators using an inductively coupled plasma source

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 5, 1998, Pages 2849-2854

  Rakhshandehroo, M R ^a   Weigold, J W ^a   Tian, W C ^a   Pang, S W ^a  

^a University of Michigan   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000249570     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590283     Document Type: Article

References (25)

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