Influence of coil power on the etching characteristics in a high density plasma etcher

Journal of the Electrochemical Society

Volumn 146, Issue 7, 1999, Pages 2730-2736

  Ayon A A ^a   Braff, R A ^a   Bayt, R ^a   Sawin, H H ^a   Schmidt, M A ^a  

^a USA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC COILS; MICROMACHINING; SEMICONDUCTOR DEVICE STRUCTURES; SILICON WAFERS; SULFUR COMPOUNDS;

INDUCTIVELY COUPLED PLASMA ETCHERS; SULFUR HEXAFLUORIDE;

PLASMA ETCHING;

EID: 0142087216     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1392001     Document Type: Article

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