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Volumn 89, Issue 8, 2001, Pages 4365-4375

Optoelectronic device performance on reduced threading dislocation density GaAs/Si

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0035871275     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1347000     Document Type: Article
Times cited : (52)

References (42)
  • 32
    • 0003598030 scopus 로고
    • Butterworth
    • The accuracy with which the distance between the rods can be measured sets the limit of accuracy that the d-spacing can be determined. In this case, the accuracy is believed to be only good enough to discriminate between the (220) spacing of either GaAs or silicon (e.g., the epitaxial layer is either pseudomorphic or relaxed), but not sufficient to determine the exact state of strain relaxation. See, for example, P. Hirsch, A. Howie, R. Nicholson, D. Paschley, and M. Whelan, Electron Microscopy of Thin Crystals (Butterworth, 1965), p. 364.
    • (1965) Electron Microscopy of Thin Crystals , pp. 364
    • Hirsch, P.1    Howie, A.2    Nicholson, R.3    Paschley, D.4    Whelan, M.5
  • 35
    • 0346579722 scopus 로고    scopus 로고
    • Unpublished results KOPIN, Inc.
    • Unpublished results from M. Micci, KOPIN, Inc. (1998).
    • (1998)
    • Micci, M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.