Multilayer coating and tests of a 10X extreme ultraviolet lithographic camera

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3331, Issue , 1998, Pages 62-71

  Spiller, E ^a   Weber, F J ^a   Montcalm, C ^a   Baker, S L ^a   Gullikson, E M ^a   Underwood, J H ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

EUV lithography; EUV scattering; Mo Si multilayer coatings; Power spectral density; Schwarzschild optics

Indexed keywords

CAMERAS; LIGHT REFLECTION; LIGHT SCATTERING; MAGNETRON SPUTTERING; OPTICAL COATINGS; OPTICAL MULTILAYERS; SYNCHROTRON RADIATION; ULTRAVIOLET RADIATION;

ULTRAVIOLET LITHOGRAPHIC CAMERAS;

PHOTOLITHOGRAPHY;

EID: 0032401526     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.309617     Document Type: Conference Paper

References (5)

1. Recent results in the development of an integrated EUV Laboratory tool
2. Phase shifting diffraction interferometry for measuring extreme ultraviolet optics
3. Fabrication and testing of EUVL optics
4. Multilayer facilities required for extreme-ultraviolet lithography
5. Beamline for metrology of x-ray/EUV optics at the advanced light source