Applications of atomic force microscopy/scanning capacitance microscopy in imaging implant structures of semiconductor devices

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 4, 2001, Pages 1154-1157

  Chao, Kuo Jen ^a   Kingsley, Jeffrey R ^a   Plano, Robert J ^a   Lu, Xing ^a   Ward, Ian ^a  

^a CHARLES EVANS AND ASSOCIATES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CAPACITANCE; FAILURE ANALYSIS; POLISHING; PROCESS CONTROL; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING GALLIUM ARSENIDE; SILICON NITRIDE; SPECTROSCOPIC ANALYSIS; THERMAL EFFECTS; THICKNESS MEASUREMENT;

IMAGING IMPLANT STRUCTURES; SCANNING CAPACITANCE MICROSCOPY;

SEMICONDUCTOR DEVICES;

EID: 0035535242     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1384556     Document Type: Conference Paper

References (12)

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