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Volumn 16, Issue 1, 1998, Pages 339-343

Scanning capacitance microscopy measurement of two-dimensional dopant profiles across junctions

Author keywords

[No Author keywords available]

Indexed keywords


EID: 11644316840     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589807     Document Type: Article
Times cited : (40)

References (14)
  • 5
    • 85069398863 scopus 로고    scopus 로고
    • The National Technology Roadmap for Semiconductors is published by the Semiconductor Industry Association, 4300 Stevens Creek Boulevard, Suite 271, San Jose, CA 95129
    • The National Technology Roadmap for Semiconductors is published by the Semiconductor Industry Association, 4300 Stevens Creek Boulevard, Suite 271, San Jose, CA 95129.
  • 10
    • 0030106718 scopus 로고    scopus 로고
    • J. F. Marchiando, Int. J. Numer. Methods Eng. 39, 1029 (1996); J. Res. Inst. Stand. Technol. 100, 661 (1995).
    • (1995) J. Res. Inst. Stand. Technol. , vol.100 , pp. 661


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.