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Volumn 14, Issue 1, 1996, Pages 447-451
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Two-dimensional dopant profiling of very large scale integrated devices using selective etching and atomic force microscopy
a,b a a a b |
Author keywords
[No Author keywords available]
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Indexed keywords
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EID: 0001191165
PISSN: 10711023
EISSN: None
Source Type: Journal
DOI: 10.1116/1.588492 Document Type: Article |
Times cited : (17)
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References (13)
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