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Volumn 14, Issue 1, 1996, Pages 447-451

Two-dimensional dopant profiling of very large scale integrated devices using selective etching and atomic force microscopy

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0001191165     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588492     Document Type: Article
Times cited : (17)

References (13)
  • 1
    • 4243119256 scopus 로고    scopus 로고
    • The National Roadmap for Semiconductor Technology is published by the Semiconductor Industry Association, 4300 Stevens Creek Boulevard, Suite 271, San Jose, CA 95129
    • The National Roadmap for Semiconductor Technology is published by the Semiconductor Industry Association, 4300 Stevens Creek Boulevard, Suite 271, San Jose, CA 95129.
  • 6
    • 0026897020 scopus 로고
    • J. A. Dagata, W. Tseng, J. Bennett, J Schneir, and H. H. Harary, Appl. Phys. Lett. 59, 3288 (1991); Ultramicroscopy 42, 1288 (1992).
    • (1992) Ultramicroscopy , vol.42 , pp. 1288


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.