메뉴 건너뛰기




Volumn 45, Issue 10, 2001, Pages 1705-1716

A physical compact model for direct tunneling from NMOS inversion layers

Author keywords

Circuit simulation; Direct tunneling; Gate current; MOS model; Quantum effects

Indexed keywords

COMPUTER SIMULATION; CURRENT DENSITY; ELECTRON TUNNELING; GATES (TRANSISTOR); MATHEMATICAL MODELS; POISSON EQUATION; QUANTUM THEORY; WAVE EQUATIONS;

EID: 0035478864     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0038-1101(01)00220-9     Document Type: Article
Times cited : (36)

References (39)
  • 2
    • 9144258943 scopus 로고
    • Generalized formula for the electric tunnel effect between similar electrodes separated by a thin insulating film
    • (1963) J Appl Phys , vol.34 , Issue.6 , pp. 1793-1803
    • Simmons, J.1
  • 4
    • 0003433478 scopus 로고    scopus 로고
    • Quantum mechanical modeling of electron tunneling current from the inversion layer of ultra-thin-oxide nMOSFETs
    • (1999) IBM J Res , vol.43 , Issue.3 , pp. 209-211
    • Lo, S.H.1    Buchanan, D.A.2    Taur, Y.3
  • 15
    • 0000737464 scopus 로고
    • Self-consistent calculation of electron and hole inversion charges at silicon-silicon dioxide interfaces
    • (1986) J Appl Phys , vol.59 , Issue.9 , pp. 3175-3183
    • Moglestue, C.1
  • 16
    • 0032095761 scopus 로고    scopus 로고
    • Analysis of the MOS transistor based on the self-consistent solution to the Schrödinger and Poisson equations and on the local mobility model
    • (1998) IEEE Trans Electron Dev , vol.45 , Issue.6 , pp. 1263-1271
    • Janik, T.1    Majkusiak, B.2
  • 22
    • 0003432280 scopus 로고    scopus 로고
  • 23
    • 0003432282 scopus 로고    scopus 로고
  • 27
    • 0000570079 scopus 로고    scopus 로고
    • On the reduction of direct tunneling leakage through ultrathin gate oxides by a one dimensional Schrodinger-Poisson solver
    • (2000) J Appl Phys , vol.87 , Issue.11 , pp. 7931-7939
    • Cassan, E.1
  • 35
    • 0031162957 scopus 로고    scopus 로고
    • Modelling and simulation of tunneling through ultra-thin gate dielectrics
    • (1997) J Appl Phys , vol.81 , Issue.12 , pp. 7900-7905
    • Schenk, A.1    Heiser, G.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.