PREVAIL Alpha system: Status and design considerations

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 3072-3078

  Golladay, S D ^a   Pfeiffer, H C ^a   Rockrohr, J D ^a   Stickel, W ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; COMPUTER AIDED SOFTWARE ENGINEERING; ELECTRON OPTICS; IMAGE PROCESSING; MONTE CARLO METHODS; OPTIMIZATION; PROJECTION SYSTEMS;

COULOMB INTERACTIONS; SPACE CHARGE ABERRATIONS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0034316432     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1314381     Document Type: Article

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7. H. Rose and R. Spehr, Optik (Stuttgart) 57, 339 (1980).
8. P. W. H. de Jager et al., J. Vac. Sci. Technol. B 17, 3098 (1999).