Application of the generalized curvilinear variable axis lens to electron projection

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 3029-3033

  Stickel, W ^a   Langner, G O ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABERRATIONS; DISTORTION (WAVES); ELECTRON BEAM LITHOGRAPHY; ELECTRON LENSES; IMAGING TECHNIQUES;

CURVILINEAR VARIABLE AXIS LENS (CVAL);

ELECTRON OPTICS;

EID: 0034317536     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1313579     Document Type: Article

References (11)

1. H. C. Pfeiffer and W. Stickel, Microelectron. Eng. 27, 143 (1995).
2. H. C. Pfeiffer et al., J. Vac. Sci. Technol. B 17, 2840 (1999).
3. H. C. Pfeiffer, Microelectron. Eng. 53, 61 (2000).
4. H. C. Pfeiffer, Proc. SPIE 3997, 206 (2000).
5. W. Stickel and G. O. Langner, J. Vac. Sci. Technol. B 17, 2847 (1999).
6. W. Stickel and G. O. Langner, Microelectron. Eng. 53, 283 (2000).
7. M. S. Gordon, J. E. Lieberman, P. F. Petric, C. F. Robinson, and W. Stickel, J. Vac. Sci. Technol. B 17, 2851 (1999).
8. S. D. Golladay, J. Vac. Sci. Technol. B 17, 2856 (1999).
9. H. C. Chu and E. Munro, Optik (Stuttgart) 61, 121 (1982).
10. Munro's Electron Beam Software (MEBS) Ltd., London, England.
11. T. Hosokawa, Y. Takeuchi, and H. Ohshiba, Optik (Stuttgart) 58, 241 (1981).