PREVAIL: proof-of-concept system and results

Microelectronic Engineering

Volumn 53, Issue 1, 2000, Pages 61-66

  Pfeiffer, Hans C ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; ELECTRON OPTICS; INTEGRATED CIRCUITS; MAGNETIC FIELDS; OPTICAL SYSTEMS; SCANNING;

ELECTRON BEAM PROJECTION; ELECTRON OPTICAL SYSTEM; PROOF OF CONCEPT SYSTEM; SCAN PROJECTION LITHOGRAPHY;

MICROELECTRONICS;

EID: 0034206880     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(00)00266-5     Document Type: Article

References (9)

1. 1. (a) H. C. Pfeiffer and W. Stickel, Microelectronic Eng. 27 (1995) 143.
2. (b) H. C. Pfeiffer et al. J. Vac. Sci. Technol., B 17(6) Nov/Dec (1999).
3. 2. M. Gordon et al., J. Vac. Sci. Technol. B17(6) Nov/Dec (1999).
4. 3. W. Stickel, J. Vac. Sci. Technol. B16(6) Nov/Dec (1998) 3211.
5. 4. S. D. Golladay et al., J. Vac. Sci. Technol. B17(6) Nov/Dec (1999).
6. 5. M. Essig and H. C. Pfeiffer, J. Vac. Sci. Technol B4(1), (1986) 83.
7. 6. H.C. Pfeiffer, W. Stickel, US Patent 5,674,413
8. 7. M. A. Sturans, et al., J. Vac. Sci. Technol. B 16(6) Nov/Dec (1998) 3164.
9. 8. J. Greschner et al., German Patent 19710798.2