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Journal of Chemical Physics

Volumn 114, Issue 21, 2001, Pages 9549-9556

A comparative study of dissociative adsorption of NH3, PH3, and AsH3 on Si(001)-(2×1)

(4) Miotto, R a Srivastava, G P a Miwa, R H b Ferraz, A C c

a UNIVERSITY OF EXETER (United Kingdom)

b FEDERAL UNIVERSITY OF UBERLÂNDIA (Brazil)

c UNIVERSITY OF SÃO PAULO (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; ARSENIC COMPOUNDS; DIMERS; DISSOCIATION; GAS ADSORPTION; PHOSPHORUS COMPOUNDS; SEMICONDUCTING SILICON; SEMICONDUCTOR GROWTH; SPECTRUM ANALYSIS; SURFACE PHENOMENA;

DISSOCIATIVE ADSORPTION; PSEUDOPOTENTIAL METHOD;

CRYSTAL ATOMIC STRUCTURE;

EID: 0035366979 PISSN: 00219606 EISSN: None Source Type: Journal
DOI: 10.1063/1.1355766 Document Type: Article

Times cited : (55)

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