Low-temperature nitridation of silicon surface using NH3-decomposed species in a catalytic chemical vapor deposition system

Applied Physics Letters

Volumn 71, Issue 10, 1997, Pages 1371-1372

  Izumi, Akira ^a   Matsumura, Hideki ^a  

^a JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001125632     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.119897     Document Type: Article

References (16)

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