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Solid State Ionics

Volumn 141-142, Issue , 2001, Pages 63-69

Composition and chemical structure characteristics of CNx layers prepared by different plasma assisted techniques

(5) Ujvari T a Toth A a Mohai, M a Szepvolgyi J a Bertoti I a

a CHEMICAL RESEARCH CENTER (Hungary)

Author keywords

Carbon nitride; CNx; IR; Magnetron sputtering; PECVD; XPS

Indexed keywords

CARBON NITRIDE; COMPOSITION EFFECTS; CRYSTAL ORIENTATION; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MAGNETRON SPUTTERING; NITROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON WAFERS; SODIUM CHLORIDE; STOICHIOMETRY; X RAY PHOTOELECTRON SPECTROSCOPY;

DIRECT CURRENT MAGNETRON SPUTTERING; PHOTOELECTRON PEAK-COMPONENTS; RADIO FREQUENCY MAGNETRON SPUTTERING;

AMORPHOUS FILMS;

EID: 0035330555 PISSN: 01672738 EISSN: None Source Type: Journal
DOI: 10.1016/S0167-2738(01)00722-6 Document Type: Conference Paper

Times cited : (12)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.