Monitoring the structural and chemical properties of CNx thin films during in situ annealing in a TEM

EPJ Applied Physics

Volumn 13, Issue 2, 2001, Pages 97-105

  Grillo, S E ^a,e   Hellgren, N ^b,f   Serin, V ^a   Broitman, E ^b   Colliex, C ^c,d   Hultman, L ^b   Kihn, Y ^a  

^a CEMES CNRS   (France)

^b LINKÖPING UNIVERSITY   (Sweden)

^c UNIVERSITÉ PARIS SUD   (France)

^d LABORATOIRE AIMÉ COTTON   (France)

^e UNIVERSITÉ DE PERPIGNAN   (France)

^f University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CARBON NITRIDE; ELECTRON ENERGY LOSS SPECTROSCOPY; FULLERENES; GRAPHITIZATION; HIGH RESOLUTION ELECTRON MICROSCOPY; MAGNETRON SPUTTERING; NITROGEN; SYNTHESIS (CHEMICAL); THERMAL EFFECTS; THERMODYNAMIC STABILITY; THIN FILMS;

PYRIDINE;

AMORPHOUS FILMS;

EID: 0035249137     PISSN: 12860042     EISSN: None     Source Type: Journal    
DOI: 10.1051/epjap:2001118     Document Type: Article

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