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Applied Physics A: Materials Science and Processing

Volumn 69, Issue 6, 1999, Pages 641-647

Characterization of heat-treated CN films fabricated by dual-facing-target sputtering for soft X-ray multilayer mirrors

(6) Bai, H L a Jiang, E Y a Wu, P a Lou, Z D a Wang, Y a Wang, C D a

a TIANJIN UNIVERSITY (China)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL BONDS; CRYSTAL ATOMIC STRUCTURE; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY MEASUREMENT; MIRRORS; NITRIDES; OPTICAL MULTILAYERS; RELAXATION PROCESSES; SPUTTERING; THERMAL EFFECTS; X RAY APPARATUS;

CARBON NITRIDE; DUAL-FACING TARGET SPUTTERING; SOFT X RAYS;

FILMS;

EID: 0033329807 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s003390051046 Document Type: Article

Times cited : (13)

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