Study of the thermal stability of carbon nitride thin films prepared by reactive magnetron sputtering

Diamond and Related Materials

Volumn 9, Issue 2, 2000, Pages 212-218

  Fernandez Ramos C ^a   Sayagues M J ^a   Rojas, T C ^a   Alcala M D ^a   Real, C ^a   Fernandez A ^a  

^a UNIVERSITY OF SEVILLE   (Spain)

Author keywords

Carbon nitride thin films; CNx; Magnetron sputtering; Thermal evolution

Indexed keywords

AMORPHOUS FILMS; ELECTRON ENERGY LOSS SPECTROSCOPY; FILM PREPARATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MAGNETRON SPUTTERING; MASS SPECTROMETRY; NITROGEN; THERMODYNAMIC STABILITY; THERMOGRAVIMETRIC ANALYSIS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE;

NITRIDES;

EID: 0033905258     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0925-9635(00)00233-8     Document Type: Article

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