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Volumn 121, Issue 34, 1999, Pages 7957-7958

Preparation of macroporous metal films from colloidal crystals [14]

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; GOLD; METAL; NICKEL; PLATINUM; SILICON DIOXIDE; SILVER;

EID: 0033198550     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja991321h     Document Type: Letter
Times cited : (397)

References (25)
  • 12
    • 0028594017 scopus 로고
    • (a) Martin, C. R. Science 1994, 266, 1961.
    • (1994) Science , vol.266 , pp. 1961
    • Martin, C.R.1
  • 23
    • 0030035841 scopus 로고    scopus 로고
    • Electroless plating of copper is performed at room temperature by the technique described by Kim el al. (Kim, E.; Xia, Y.; Whitesides, G. M. J. Am. Chem. Soc. 1996, 118, 5722). A Technic EN 9148 low phosphorus electroless nickel bath (Technic Inc., RI) is used (T = 87°C) to plate nickel. A commercial silvering bath (HE-300, Peacock Laboratories, Philadelphia, PA) is used to plate silver at room temperature. A commercial gold electroless plating solution (Oromerse SO, Technic Inc.) is used to plale gold (T = 70 °C). Electroless plating of platinum is performed at room temperature by the technique described by Rhoda et al. (Rhoda, R. N.; Suffern, N. Y.; Vines, R. F.; Chatham, N. J. U.S. patent 3, 486, 928, 1969).
    • (1996) J. Am. Chem. Soc. , vol.118 , pp. 5722
    • Kim, E.1    Xia, Y.2    Whitesides, G.M.3
  • 24
    • 0345434111 scopus 로고    scopus 로고
    • U.S. patent 3, 486, 928, 1969
    • Electroless plating of copper is performed at room temperature by the technique described by Kim el al. (Kim, E.; Xia, Y.; Whitesides, G. M. J. Am. Chem. Soc. 1996, 118, 5722). A Technic EN 9148 low phosphorus electroless nickel bath (Technic Inc., RI) is used (T = 87°C) to plate nickel. A commercial silvering bath (HE-300, Peacock Laboratories, Philadelphia, PA) is used to plate silver at room temperature. A commercial gold electroless plating solution (Oromerse SO, Technic Inc.) is used to plale gold (T = 70 °C). Electroless plating of platinum is performed at room temperature by the technique described by Rhoda et al. (Rhoda, R. N.; Suffern, N. Y.; Vines, R. F.; Chatham, N. J. U.S. patent 3, 486, 928, 1969).
    • Rhoda, R.N.1    Suffern, N.Y.2    Vines, R.F.3    Chatham, N.J.4
  • 25
    • 0345002990 scopus 로고    scopus 로고
    • note
    • Surface areas are calculated by assuming spherical air voids (215 nm diameter) fill 74% of the volume of the metal. No attempt is made to correct for the loss of surface area caused by the interconnections between pores, or for the enhancement of surface area due to surface roughness.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.