Line width control using a defocused low voltage electron beam

Microelectronic Engineering

Volumn 46, Issue 1, 1999, Pages 219-222

  David, C ^a   Hambach, D ^a,b  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

^b Forschungseinrichtung Rontgenphysik   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON ENERGY LEVELS; FOCUSING; MATHEMATICAL MODELS; OPTICAL DEVICES; X RAY LITHOGRAPHY;

DEFOCUSING; FRESNEL ZONE PLATES; LINE WIDTH CONTROL; X-RAY MICROFOCUSING;

ELECTRON BEAM LITHOGRAPHY;

EID: 0033131626     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(99)00066-0     Document Type: Article

References (3)

1. 1. B. Niemann et al., Microelectronic Engineering vol. 30 (1996) 49-52
2. 2. A. Snigirev et al.; Rev. Sci. Instrum. vol. 66, no.2, (1995) 1461-1463.
3. 3. Ya. Hartman, et al.; Nucl. Instr. and Meth. vol. A385, (1997) 371-375.