Reduction of effects of rarefaction in ionized physical vapour deposition discharges

Plasma Sources Science and Technology

Volumn 9, Issue 4, 2000, Pages 562-567

  Andrew, Y ^a   Booske, J H ^a   Lu, S ^a   Snodgrass, T G ^a   Wendt, A E ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ASPECT RATIO; DIFFUSION; ELECTRIC POTENTIAL; IONIZATION OF SOLIDS; MAGNETOPLASMA; MAGNETRON SPUTTERING; THIN FILMS;

IONIZED METAL FLUXED FRACTIONS (IMFF); IONIZED PHYSICAL VAPOR DEPOSITION (IPVD);

VAPOR DEPOSITION;

EID: 0034321527     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/9/4/311     Document Type: Article

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