An rf sustained argon and copper plasma for ionized physical vapor deposition of copper

Journal of Applied Physics

Volumn 85, Issue 11, 1999, Pages 7556-7561

  Wang, W ^a   Foster, J ^a   Snodgrass, T ^a   Wendt, A E ^a   Booske, J H ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0043280888     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.370554     Document Type: Article

References (13)

1. W. M. Holber, J. S. Logan, H. J. Grabarz, J. T. C. Yeh, J. B. O. Caughman, A. Sugarman, and F. Turene, J. Vac. Sci. Technol. A 11, 2903 (1993).
2. S. M. Rossnagel and J. Hopwood, Appl. Phys. Lett. 63, 3285 (1993).
3. J. Hopwood, Phys. Plasmas 5, 1624 (1998).
4. S. Hamaguchi and S. M. Rossnagel, J. Vac. Sci. Technol. B 14, 2603 (1996).
5. P. F. Cheng, S. M. Rossnagel, and D. N. Ruzic, J. Vac. Sci. Technol. B 13, 203 (1995).
6. R. L. Rhoades and S. M. Gorbatkin, J. Appl. Phys. 80, 2605 (1996).
7. T. G. Snodgrass, J. H. Booske, W. Wang, A. E. Wendt, and J. L. Shohet, Rev. Sci. Instrum. 70, 1525 (1999).
8. W. Wang, J. Foster, A. E. Wendt, J. H. Booske, T. Onuoha, P. W. Sandstrom, H. Liu, S. S. Gearhart, and N. Hershkowitz, Appl. Phys. Lett. 71, 1622 (1997).
9. J. D. Johnson and A. J. T. Holmes, Rev. Sci. Instrum. 61, 2628 (1990).
10. F. F. Chen, Plasma Diagnostic Techniques, edited by R. H. Huddlestone and S. L. Leonard (Academic, New York, 1965).
11. L. J. Mahoney, A. E. Wendt, E. Barrios, C. J. Richards, and J. L. Shohet, J. Appl. Phys. 76, 2041 (1994).
12. J. Foster, W. Wang, A. E. Wendt, and J. H. Booske, J. Vac. Sci. Technol. B 16, 532 (1998).
13. Y. W. Kim, I. Petrov, J. E. Greene, and S. M. Rossnagel, J. Vac. Sci. Technol. A 14, 346 (1996).