Interactions between plasmas in ionized physical vapor deposition discharges

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 5, 2000, Pages 2137-2142

  Andrew, Y ^a   Lu, Z ^a   Snodgrass, T ^a   Teitzel, G ^a   Wendt, A E ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTEGRATED CIRCUIT MANUFACTURE; MAGNETRON SPUTTERING; THIN FILMS; VAPOR DEPOSITION;

INDUCTIVELY COUPLED PLASMAS (ICP); IONIZED PHYSICAL VAPOR DEPOSITION (IPVD); MAGNETRON DISCHARGES;

PLASMA INTERACTIONS;

EID: 0034272578     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1286360     Document Type: Article

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