Fabrication of masks for electron-beam projection lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 3210-3215

  Lercel, Michael ^a   Magg, Chris ^a   Barrett, Monica ^a   Collins, Kevin ^a   Trybendis, Michael ^a   Caldwell, Neal ^a   Jeffer, Ray ^a   Bouchard, Lucien ^a  

^a IBM   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGE ANALYSIS; MEMBRANES; OPTIMIZATION; STRESS ANALYSIS; X RAYS;

ELECTRON BEAM LITHOGRAPHY;

ELECTRON BEAM LITHOGRAPHY;

EID: 0034316079     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1314370     Document Type: Article

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