Stencil reticle development for electron beam projection system

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 2864-2867

  Kawata, S ^a   Katakura, N ^a   Takahashi, S ^a   Uchikawa, K ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033273514     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591085     Document Type: Article

References (14)

1. S. D. Berger and J. M. Gibson, Appl. Phys. Lett. 57, 153 (1990).
2. H. C. Pfeiffer et al., J. Vac. Sci. Technol. B (these proceedings).
3. W. H. Semke, R. L. Engelstad, E. G. Lovell, and J. A. Liddel, J. Vac. Sci. Technol. B 16, 3587 (1998).
4. J. A. Liddel, H. A. Huggins, S. D. Berger, J. M. Gibson, G. Weber, R. Kola, and C. W. Jurgensen, J. Vac. Sci. Technol. B 9, 3000 (1991).
5. B. Anderer and U. Behringer, Microelectron. Eng. 5, 67 (1985).
6. J. Butschke et al., Microelectron. Eng. 46, 473 (1999).
7. M. Oda, A. Okada, and H. Yoshihara, Proc. SPIE 2512, 152 (1995).
8. I. W. Rangelow et al., J. Vac. Sci. Technol. B 16, 3592 (1998).
9. K. Uchikawa, S. Takahashi, N. Katakura, T. Oshino, S. Kawata, and T. Ymaguchi, J. Vac. Sci. Technol. B, these proceedings.
10. T. Yahiro, N. Hirayanagi, H. Ymamoto, and K. Suzuki, Ext. Abstr. (60th Autumn Meeting 1999), Japan Society of Applied Physics and Related Societies, 4a-E-4.
11. W. Zapka, A. C. Tam, and W. Ziemlich, Microelectron. Eng. 13, 547 (1991).
12. M. Okada, N. Kandaka, N. Katakura, and K. Uchikawa, Ext. Abstr. (60th Autumn Meeting 1999), Japan Society of Applied Physics and Related Societies, 3p-E-11.
13. L. R. Harriott, Jpn. J. Appl. Phys., Part 1 33, 7094 (1994).
14. S. Shimizu and K. Uchikawa, Ext. Abstr. (60th Autumn Meeting 1999), Japan Society of Applied Physics and Related Societies, 3p-E-10.