Overview and status of the Next Generation Lithography Mask Center of Competency

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3997, Issue , 2000, Pages 10-18

  Bouchard, Lucien ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; X RAY LITHOGRAPHY;

ELECTRON BEAM PROJECTION LITHOGRAPHY; NEXT GENERATION LITHOGRAPHY (NGL);

MASKS;

EID: 0033714197     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (13)