Image size control in next generation lithography masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3997, Issue , 2000, Pages 266-275

  Lercel, Michael ^a   Magg, Chris ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FINITE DIFFERENCE METHOD; MASKS; MATHEMATICAL MODELS; X RAY LITHOGRAPHY;

CRITICAL DIMENSION (CD); NEXT GENERATION LITHOGRAPHY (NGL);

ELECTRON BEAM LITHOGRAPHY;

EID: 0033712166     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (12)