Next generation lithography mask fabrication at the NGL-MCOC

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4066, Issue , 2000, Pages 105-115

  Lercel, Michael ^a   Racette, Kenneth ^a   Magg, Christopher ^a   Lawliss, Mark ^a   Collins, Kevin ^a   Barrett, Monica ^a   Trybendis, Michael ^a   Bouchard, Lucien ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORBER PATTERNING; CHEMICALLY AMPLIFIED RESIST; ELECTRON BEAM PROJECTION LITHOGRAPHY; EXTREME ULTRAVIOLET LITHOGRAPHY; IMAGE SIZE CONTROL;

CHEMICAL VAPOR DEPOSITION; COATINGS; ELECTRON BEAM LITHOGRAPHY; PHOTORESISTS; REACTIVE ION ETCHING; SEMICONDUCTING DIAMONDS; SEMICONDUCTING SILICON; SILICON CARBIDE; SUBSTRATES; THICK FILMS; ULTRAVIOLET RADIATION; X RAY LITHOGRAPHY;

MASKS;

EID: 0033671946     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (12)