메뉴 건너뛰기




Volumn 133-134, Issue , 2000, Pages 247-252

Deposition of Si-DLC films with high hardness, low stress and high deposition rates

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION EFFECTS; HARDNESS; METHANE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILANES;

EID: 0034310618     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)00932-4     Document Type: Article
Times cited : (130)

References (24)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.