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Volumn 343-344, Issue 1-2, 1999, Pages 222-225

Hard a-C:H films deposited at high deposition rates

Author keywords

Deposition rate; Diamond like carbon; Stress, Hardness

Indexed keywords

BAND STRUCTURE; CARBON; CATHODES; FILM PREPARATION; HARDNESS; HYDROGENATION; PROTECTIVE COATINGS; RAMAN SCATTERING; SPUTTER DEPOSITION; STRESS ANALYSIS;

EID: 0032650292     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01630-7     Document Type: Article
Times cited : (8)

References (18)
  • 5
    • 0003312415 scopus 로고
    • Mechanical Properties of Thin Films Cap. 12th
    • L.I. Maissel, R. Glang (Eds.), McGraw-Hill, New York
    • D.S. Campbell, Mechanical Properties of Thin Films Cap. 12th. in: L.I. Maissel, R. Glang (Eds.), Handbook of Thin Film Technology, McGraw-Hill, New York, 1970.
    • (1970) Handbook of Thin Film Technology
    • Campbell, D.S.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.