Annealing effects on near stoichiometric a-SiC:H films

Surface and Coatings Technology

Volumn 120-121, Issue , 1999, Pages 395-400

  Baia Neto, A L ^a   Camargo Jr , S S ^b   Carius, R ^c   Finger, F ^c   Beyer, W ^c  

^a Rio de Janeiro Rural Federal University   (Brazil)

^b FEDERAL UNIVERSITY OF RIO DE JANEIRO   (Brazil)

^c FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

A SiC:H films; Annealing; Silicon; Stoichiometry

Indexed keywords

ANNEALING; DIAMOND-LIKE COATING; WEAR RESISTANCE;

EID: 0033503014     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00390-4     Document Type: Conference Paper

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