Advances in low temperature processing of silicon nitride based dielectrics and their applications in surface passivation and integrated optical devices

Semiconductor Science and Technology

Volumn 15, Issue 7, 2000, Pages

  Agnihotri, O P ^a,b   Jain, S C ^a   Poortmans, J ^a   Szlufcik, J ^a   Beaucarne, G ^a   Nijs, J ^a   Mertens, R ^a  

^a IMEC   (Belgium)

^b INDIAN INSTITUTE OF TECHNOLOGY DELHI   (India)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; INTEGRATED OPTOELECTRONICS; MICROELECTRONICS; PASSIVATION; SILICON NITRIDE; WAVEGUIDES;

DIELECTRIC-INDEX CONTRAST; OPTICAL LOSS; SURFACE RECOMBINATION VELOCITY;

DIELECTRIC MATERIALS;

EID: 0034225426     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/15/7/201     Document Type: Article

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