Optimization of LPCVD silicon oxynitride growth to large refractive index homogeneity and layer thickness uniformity

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3099, Issue , 1997, Pages 257-268

  Woerhoff, K ^a   Lambeck, Paul V ^a   Albers, H ^a   Noordman, O F ^a   Hulst, Niko F ^a   Popma, Th J ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; OPTICAL COMMUNICATION EQUIPMENT; OPTICAL WAVEGUIDES; OPTIMIZATION; REFRACTIVE INDEX; SECOND HARMONIC GENERATION; THICKNESS MEASUREMENT; THIN FILMS;

PHASE MATCHING; SILICON OXYNITRIDE;

SEMICONDUCTOR GROWTH;

EID: 0031322457     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)