Low energy electron proximity printing using a self-assembled monolayer resist

Microelectronic Engineering

Volumn 30, Issue 1-4, 1996, Pages 57-60

  David, C ^a   Muller H U ^a   Volkel B ^a   Grunze, M ^a  

^a UNIVERSITY OF HEIDELBERG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION GRATINGS; ELECTRONS; MASKS; MONOLAYERS; NANOTECHNOLOGY; REACTIVE ION ETCHING; SEMICONDUCTING SILICON;

LOW ENERGY ELECTRON PROXIMITY PRINTING; SELF ASSEMBLED MONOLAYERS; ULTRATHIN RESIST SYSTEMS; WET CHEMICAL ETCHING;

LITHOGRAPHY;

EID: 0029732726     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-9317(95)00194-8     Document Type: Article

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