Comparison of CxNy:H films obtained by deposition using magnetron sputtering or an inductively coupled plasma

Surface and Interface Analysis

Volumn 29, Issue 6, 2000, Pages 369-376

  Zeze, D A ^a   North, D R ^a   Brown, N M D ^a   Anderson, C A ^a  

^a UNIVERSITY OF ULSTER   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

GRAPHITE; HYDROCARBONS; MAGNETRON SPUTTERING; NITROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SECONDARY ION MASS SPECTROMETRY; SPUTTER DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE; INDUCTIVELY COUPLED PLASMA (ICP);

CARBON INORGANIC COMPOUNDS;

EID: 0033717558     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/1096-9918(200006)29:6<369::AID-SIA878>3.0.CO;2-D     Document Type: Article

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