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Volumn 29, Issue 3, 2000, Pages 201-207
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Investigation of the uniformity and coverage of CxNy: H overcoatings during PECVD in an inductively coupled plasma
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Author keywords
AES; CN; Raman; SEM; XPS
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Indexed keywords
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EID: 0343158891
PISSN: 01422421
EISSN: None
Source Type: Journal
DOI: 10.1002/(SICI)1096-9918(200003)29:3<201::AID-SIA686>3.0.CO;2-W Document Type: Article |
Times cited : (4)
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References (21)
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