Sputtering rate change and surface roughening during oblique and normal incidence O2+ bombardment of silicon, with and without oxygen flooding

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 6, 1998, Pages 3099-3104

  Magee, Charles W ^a   Mount, Gary R ^b   Smith, Stephen P ^b   Herner, Brad ^c   Gossmann, Hans J ^c  

^a Evans East   (United States)

^b CHARLES EVANS AND ASSOCIATES   (United States)

^c LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000513631     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (18)

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