Preliminary electrical characterization of pulsed-plasma enhanced chemical vapor deposited teflon-like thin films

Materials Research Society Symposium - Proceedings

Volumn 443, Issue , 1997, Pages 189-194

  Labelle, Catherine B ^a   Limb, Scott J ^a   Gleason, Karen K ^a   Burns, James A ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRON SPIN RESONANCE SPECTROSCOPY; ELECTRONS; FREE RADICALS; MATHEMATICAL MODELS; PERMITTIVITY; PLASMA APPLICATIONS; THIN FILMS;

FREE ELECTRONS; PULSED PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD);

DIELECTRIC FILMS;

EID: 0030673795     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (15)