A review of the present state of art in hard coatings grown from the vapor phase

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 4, Issue 5, 1986, Pages 2259-2279

  Sundgren, J E ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84916809891     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.574062     Document Type: Article

References (261)

1. S. Hampshire, H. K. Park, D. P. Thompson, and R. H. Jack, Nature 274, 880 (1978).
2. L. E. Toth Transition Metal Carbides and Nitrides (Academic, New York, 1971).
3. G. Boothroyd, Proc. Inst. Mech. Eng. 177, 789 (1963).
4. E. A. Almond, Vacuum 34, 835 (1984).
5. B. Kramer, Thin Solid Films 108, 117 (1983).
6. H. J. Goldsmith, Interstitial Alloys (Plenum, New York, 1967).
7. A. G. Blachman, J. Vac. Sci. Technol. 10, 299 (1973).
8. R. W. Hoffman, in Physics of Thin Films, edited by G. Hass and R. E. Thun (Academic, New York, 1966), Vol. 3, p. 211.
9. E. Klokholm and B. S. Berry, J. Electrochem. Soc, 115, 823 (1968).
10. J. A. Thornton and D. W. Hoffman, J. Vac. Sci. Technol. A 3, 576 (1985).
11. U. Helmersson, B. O. Johansson, J.-E. Sundgren, H. T. G. Hentzell, and P. Billgren, J. Vac. Sci. Technol. A 3, 308 (1985).
12. A. Pan and J. E. Greene, Thin Solid Films 97, 79 (1982).
13. P. Heilman and P. Billgren, in Proceedings of the 1984 International Powder Metallurgy Conference, Toronto, June 17–22, 1984 (unpub-lished), p. 33.
14. D. H. Buckley, Surface Effects in Adhesion, Friction Wear and Lubrication (Elsevier, Amsterdam, 1981).
15. B. M. Kramer and P. K. Judd, J. Vac. Sci. Technol. A 3, 2439 (1985).
16. B. M. Kramer and N. P. Suh, J. Eng. Ind. 102, 303 (1980).
17. N. W. Ashcroft and N. D. Mermin, Solid State Physics (Holt, Rinehart and Winston, New York, 1976), p. 387.
18. C. A. Brookes, in Science of Hard Materials, IOP Conference Series No. 75, edited by E. A. Almond, C. A. Brockes, and R. Warren (IOP, Bristol, 1986), p. 207.
19. A. Neckel, P. Rastl, R. Eibler, P. Weinberger, and K. Schwarz, J. Phys. C 9, 579 (1976).
20. J.-E. Sundgren, unpublished thin-film results.
21. J. N. Plendle and P. J. Gielisse, Phys. Rev. B 125, 828 (1962).
22. J. J. Gilman, J. Appl. Phys. 41, 1664 (1970).
23. L. E. Murr, Interfacial Phenomena in Metals and Alloys (Addison Wesley, Reading, 1975), p. 285.
24. G. Grimvall and M. Thiessen, in Ref. 18, p. 61.
25. B. Lawn and R. Wilshaw, J. Mater. Sci. 10, 1049 (1975).
26. G. R. Sawyer, P. M. Sargent, and T. F. Page, J. Mater. Sci. 15, 1001 (1980).
27. P. M. Sargent and T. F. Page, Proc. Brit. Ceram. Soc. 26, 209 (1978).
28. E. Hummer and A. J. Perry, Thin Solid Films 101, 243 (1983).
29. W. D. Sproul, Thin Solid Films 107, 141 (1983).
30. P. Hansen, Physical Metallurgy (Cambridge University Press, Cambridge, 1978).
31. R. W. Armstrong, I. Codd, R. Deuthwaith, and N. J. Petch, Philos. Mag. 7, 45 (1962).
32. S. Komiya, S. Ono, and N. Umezu, Thin Solid Films 45, 473 (1977).
33. J. A. Augis, C. C. Lo, and M. R. Pinnel, Thin Solid Films 58, 357 (1979).
34. E. Wierenger, A. G. Dirks, and J. J. van den Broek, Thin Solid Films 119, 375 (1984).
35. J.-E. Sundgren, Thin Solid Films 128, 21 (1985).
36. B. O. Johansson, J.-E. Sundgren, J. E. Greene, A. Rockett, and S. A. Barnett, J. Vac. Sci. Technol. A 3, 303 (1985).
37. M. K. Hibbs, B. O. Johansson, J.-E. Sundgren, Helmersson, Thin Solid Films 122, 115 (1984).
38. B. E. Jacobsson, R. Nimmagadda, and R. F. Bunshah, Thin Solid Films 63, 333 (1979).
39. C. R. M. Grovenor, H. T. G. Hentzell, and D. A. Smith, Acta Metall. 32, 773 (1984).
40. B. E. Jacobsson, R. F. Bunshah, Nimmagadda, Thin Solid Films 54, 107 (1978).
41. W. D. Munz and G. Hessberger, Vak. Tech. 30, 78 (1981).
42. A. C. Raghuram and R. F. Bunshah, J. Vac. Sci. Technol. 9, 1289 (1972).
43. H. O. Piersson and A. W. Mullendore, Thin Solid Films 72, 511 (1980).
44. H. O. Piersson and A. W. Mullendore, Thin Solid Films 95, 99 (1982).
45. R. F. Bunshah, R. Nimmagadda, W. Dunford, B. A. Movchan, A. V. Demchishin, and N. A. Chursanov, Thin Solid Films 54, 85 (1978).
46. E. Randich, Thin Solid Films 72, 517 (1980).
47. B. A. Movchan and A. V. Demchishin, Fiz. Met. Metalloved. 28, 83 (1969).
48. J. A. Thornton and J. Chin, Ceram. Bull. 56, 504 (1977).
49. J. Chevallier, J. P. Chabert, and J. Spitz, Departement de Metallurgie, Centre d’Etudes Nuclearies de Grenoble, 1981, Internal Report No. 21/28, abstract in Thin Solid Films 80, 263 (1981).
50. R. Nimmagadda and R. F. Bunshah, Thin Solid Films 63, 327 (1979).
51. B. O. Johansson, J.-E. Sundgren, U. Helmersson, and M. K. Hibbs, Appl. Phys. Lett. 44, 670 (1984).
52. A. Aubert, R. Gillet, A. Gaucher, and J. P. Terrat, Thin Solid Films 108, 165 (1983).
53. J.-E. Sundgren, B. O. Johansson, and S.-E. Karlsson, Thin Solid Films 80, 77 (1981).
54. T. Shikama, H. Araki, M. Fujitsuka, M. Fukutomi, H. Shinno, and M. Okada, Thin Solid Films 106, 185 (1983).
55. J. P. Noel, D. C. Houghton, G. Este, F. R. Shepherd, J. Vac. Sci. Technol. A2, 284 (1984).
56. W. D. Sproul, Thin Solid Films 118, 279 (1984).
57. B. O. Johansson, U. Helmersson, M. K. Hibbs, and J.-E. Sundgren, J. Appl. Phys. 58, 3104 (1985).
58. A. J. Perry, Thin Solid Films 118, 271 (1984)
59. W. S. Williams, Trans. AIME 236, 211 (1966).
60. A. Pan and J. E. Greene, Thin Solid Films 78, 25 (1981).
61. A. J. Crocker and M. Wilson, J. Mater. Sci. 13, 833 (1978).
62. S. G. Roberts, P. Piruz, and P. B. Hirsch, J. de Physique, Suppl. C4, 444 (1983).
63. P. B. Hirsch, Microscopy of Semiconductor Materials, Oxford 1983, IOP Conf. Ser. No. 67 (IOP, Bristol, 1983), p. 1.
64. D. W. Hofmann and J. A. Thornton, Thin Solid Films 49, 355 (1977).
65. J. A. Thornton and D. W. Hofmann, J. Vac. Sci. Technol. 18, 203 (1981).
66. T. Takahashi and E. J. Freise, Philos. Mag. 12, 1 (1965).
67. J.-E. Sundgren, B. O. Johansson, A. Rockett, S. A. Barnett, and J. E. Greene, in Protective Coatings, edited by W. D. Sproul, J. A. Thornton, and J. E. Greene (American Institute of Physics, New York, in press).
68. G. Hagg, Z. Phys. Chem. B 12, 33 (1931)
69. W. H. Class, J. Vac. Sci. Technol. 20, 345 (1982).
70. W. Schintlmeister and O. Packer, J. Vac. Sci. Technol. 12, 743 (1975).
71. B. Karlsson, R. P. Shimshock, B. O. Seraphin, and J. C. Haygarth, Phys. Seri. 25, 775 (1982).
72. J. Rivory, I. Behaghel, J. M. Berthier, Thin Solid Films 78, 161 (1981).
73. B. Karlsson, J.-E. Sundgren, and B. O. Johansson, Thin Solid Films 87, 181 (1982).
74. M. Wittmer, B. Studer, and H. Melchior, J. Appl. Phys. 52, 5722 (1981).
75. M. A. Nicholet, Thin Solid Films 52, 415 (1978).
76. H. Melchior, Thin Solid Films 93, 397 (1982).
77. J. R. Petersson, J. Vac. Sci. Technol. 11, 715 (1974).
78. S. K. Naik, Planseeber. Pulvermetall. 25, 32 (1977).
79. H. Itoh, J. Electrochem. Soc. 124, 797 (1977).
80. M. E. Sjostrand, in Proceedings of the 7th International Conference on Chemical Vapor Deposition (Electrochemical Society, Los Angeles, 1979), p. 452.
81. W. Schintlmeister, J. Electrochem. Soc. 123, 924 (1976).
82. K. Nakamura, K. Inagawa, Thin Solid Films, 40 155 (1977).
83. T. Sato, Thin Solid Films 54, 61 (1978).
84. H. Yoshihara J. Vac. Sci. Technol. 16, 1007 (1979).
85. J.-E. Sundgren, Thin Solid Films 105, 367 (1983)
86. G. Lemperiere Thin Solid Films 111, 339 (1984).
87. W. Posadowski, Thin Solid Films 62, 347 (1979).
88. K. Y. Ahn, M. Wittmer, and C. Y. Ting, Thin Solid Films 107, 45 (1982).
89. A. Armigliato, Thin Solid Films 92, 341 (1982).
90. W. J. Garceau, P. R. Fournier, Thin Solid Films 60, 237 (1979).
91. S. Schiller, Thin Solid Films 111, 259 (1984).
92. J. M. Poitevin, Thin Solid Films 97, 69 (1982).
93. E. Moll, Thin Solid Films 80, 265 (1981).
94. A. K. Suri, Thin Solid Films 72, 529 (1980).
95. B. Zega, Thin Solid Films 45, 577 (1977).
96. W. Fleisher, Thin Solid Films 63, 347 (1979).
97. Y. Igasaki Thin Solid Films 70, 17 (1980).
98. A. Matthews Thin Solid Films 73, 315 (1980).
99. W. D. Miinz, Thin Solid Films 96, 79 (1982).
100. A. J. Aronsson, Thin Solid Films 72, 535 (1980).
101. S. Ramalingam and W. O. Winer, Thin Solid Films 73, 267 (1980).
102. M. Kobayashi Thin Solid Films 54, 67 (1978).
103. S. Schiller, Thin Solid Films 118, 255 (1984).
104. J. M. Poitevin Thin Solid Films 120, 223 (1984).
105. Y. Vilok, Sov. Metall. Met. Ceram. 17, 467 (1978).
106. H. J. Goldsmith, Interstitial Alloys (Plenum, New York, 1967), p. 219.
107. M. K. Hibbs, Thin Solid Films 107, 149 (1983).
108. A. Matthews in Proceedings of the International Ion Engineering Congress, ISIAT IPAT 83, Kyoto, 12–16 Sept. 1983, edited by T. Takagi (Institute of Electrical Engineers of Japan, Tokyo, 1983)
109. M. K. Hibbs, Acta Metall. 33, 797 (1985).
110. M. Sjostrand, in proceedings from the Continuing Education Institute Short Course on Nitride and Cabride Coatings, Soderkoping, Sweden, Aug. 1984.
111. L. Krusin-Elbaum, Thin Solid Films 104, 81 (1983).
112. M. Ostling, J. Vac. Sci. Technol. 281 (1984).
113. F. T. J. Smith, J. Appl. Phys. 41, 4227 (1970).
114. P. R. Aron Thin Solid Films 96, 87 (1982).
115. U7A. Grill Thin Solid Films 108, 173 (1983).
116. E. Rudy, Metall. Trans. 1, 1249 (1970).
117. E. Rudy Monatsh. Chem. 92, 415 (1981).
118. M. Billy Bull. Soc. Chim. Fr. 5, 1527 (1973).
119. B. O. Johansson, J. Appl. Phys. 58, 3112 (1985).
120. S. Abdin Thin Solid Films 57, 327 (1979).
121. R. Petrovic, Thin Solid Films 57, 333 (1979).
122. W. D. Miinz, in Ref. 112.
123. A. Aubert and J. Spitz, Thin Solid Films 96, 191 (1982).
124. S. A. Wolf, D. U. Gubser, J. Vac. Sci. Technol. 18, 253 (1981).
125. D. A. Papaconstantopoulos, W. E. Pickett, B. M. Klein, Phys. Rev. B 31, 752 (1985).
126. I. L. Singer, R. N. Boster, Thin Solid Films 107, 207 (1983)
127. S. Komia, Thin Solid Films 45, 433 (1977).
128. J. Gobel, Z. Anal. Chem. 319, 771 (1984).
129. H. Jehn J. Less-Common Met. 58, 85 (1978).
130. G. Linker, J. Phys. F 14, 115 (1984).
131. H. T. G. Hentzell (unpublished).
132. S. B. Hyder J. Electrochem. Soc. 123, 1721 (1976).
133. S. P. Muvarka, J. Electrochem. Soc. 126, 1951 (1979).
134. T. Takahashi, J. Cryst. Growth 47, 245 (1979).
135. E. Amberger J. Cryst. Growth 16, 306 (1972).
136. C. Weissmantel., Thin Solid Films 96, 31 (1982).
137. K. L. Chopra, Thin Solid Films 126, 307 (1985).
138. C. Weissmantel, J. Vac. Sci. Technol. 18, 179 (1981).
139. S. Shanfieldand J. Vac. Sci. Technol. A 1, 323 (1983).
140. O. Gafri, Thin Solid
141. R. Feurer, Proceedings of the Third European Conference on Chemical Vapor Deposition, Neuchatel, Switzerland, 1980 (Laboratoire Suisse de Recherches Hortogeres, Neuchatel, 1980), p. 49.
142. P. K. Chaudhari J. Electrochem. Soc. 121, 89 (1976).
143. A. R. Reinberg, Annu. Rev. Mater. Sci. 9, 341 (1979).
144. A. K. Sinha, J. Electrochem. Soc. 122, 1714 (1975).
145. S. P. Murarka J. Appl. Phys. 51, 350 (1980).
146. W. Hanni Proceedings of the 8th International Conference on Chemical Vapor Deposition (Electrochemical Society, Pennington, NJ, 1981), p. 597.
147. Y. Ron, Thin Solid Films 107, 181 (1983).
148. V. Y. Doo, J. Electrochem Soc. 115, 61 (1968).
149. P. C. Pareckh, Solid State Electron. 16, 954 (1973).
150. W. A. Plisking, J. Vac. Sci. Technol. 14, 1064 (1977).
151. G. J. Kominiak, J. Electrochem. Soc. 122, 1271 (1975).
152. C. J. Mogab J. Appl. Phys. 47, 1302 (1976).
153. Numerical Data and Functional Relationships in Science and Technology, edited by K.-H. Hellweg and A. M. Hellweg, Landolt-Bonnstein New Series, Vol. 7, (Springer-Verlag, Berlin, 1978), p. 33.
154. T. F. Retajczyk Thin Solid Films 70, 241 (1980).
155. A. Munster Z. Elektrochem. 57, 564 (1953).
156. G. Persson, Met. Prog. 97, 81 (1970).
157. P. O. Snell, Jernkontorets, Ann. 154, 413 (1970).
158. V. K. Sarin J. Electronchem. Soc. 126, 1281 (1979).
159. H. E. Hintermann, Proceedings of the 3rd International Conference on Chemical Vapor Deposition (American Nuclear Society, Hinsdale, IL, 1972), p. 352.
160. W. D. Sproul J. Vac. Sci. Technol. 12, 842 (1975).
161. N. K. Sharma, Thin Solid Films 45, 265 (1977).
162. M. Lee, Met. Technol. 130, 538 (1974).
163. C. W. Lee, Thin Solid Films 86, 63 (1981).
164. C. W. Lee Proceedings of the 8th International Conference on Chemical Vapor Deposition (Electrochemical Society, Penning-ton, NJ, 1981), p. 540.
165. S. Vourinen Proceedings of the 3rd European Con-ferenceon Chemical Vapor Deposition (Laboratoire Suisse de Recherches Hortogeres, Neuchatel, 1980), p. 177.
166. S. Vourinen, Science of Hard Materials, edited by R. K. Viswanadham, D. J. Rowcliff and J. Gurland (Plenum, New York, 1983), p. 433.
167. V. K. Sarin, in Science of Hard Materials, edited by R. K. Visuanadham, D. J. Rowcliff and J. Gurland (Plenum, New York, 1983), p. 395.
168. C. W. Lee Proceedings of the 8th International Conference on Chemical Vapor Deposition (Electrochemical Society, Penning-ton, NJ, 1981), p. 563.
169. J. S. Cho in Ref. 170, p. 573.
170. R. F. Bunshah J. Vac. Sci. Technol. 9, 1385 (1972).
171. S. Komiya, Thin Solid Films 54, 51 (1978).
172. N. G. Odrey, Thin Solid Films 79, 83 (1981).
173. A. Kinbara Thin Solid Films, 107, 359 (1983).
174. I. T. Ritchie, Thin Solid Films 72, 65 (1980)
175. M. Eizenberg, J. Appl. Phys. 54, 3190 (1983).
176. J. E. Greene, Surf. Sci. 72, 109 (1978).
177. T. Obata, J. Nucl. Mater. 103, 283 (1981).
178. H. M. Gabriel, Thin Solid Films 118, 243 (1984).
179. J.-E. Sundgren, Thin Solid Films 105, 355 (1983).
180. J.-E. Sundgren, Thin Solid Films 105, 383 (1983).
181. K. Ikawa, J. Less-Common Met. 27, 325 (1972).
182. T. Ogawa, J. Mater. Sci. 14, 125 (1979).
183. A. J. Caputo, Thin Solid Films 40, 49 (1977).
184. E. Horvath, Thin Solid Films 65, 309 (1980).
185. T. Takahashi, J. Electrochem. Soc. 121, 715 (1974).
186. W. Grossklauss, J. Vac. Sci. Technol. 12, 811 (1975).
187. N. J. Archer, J. Vac. Sci. Technol. A 2, 1261 (1984).
188. E. Eser, J. Vac. Sci. Technol. 15, 396 (1978).
189. E. Eser, J. Vac. Sci. Technol. 15, 401 (1978).
190. H. E. Hintermann, Tribol. Int. 13, 267 (1980).
191. G. Cholvy, J. L. Derep, Thin Solid Films 126, 51 (1985).
192. Gmelin Handbook of Inorganic Chemistry, Boron Suppl., Vol. 2 (Spring-er-Verlag, Berlin, 1981).
193. E. Amberger, J. Less-Common Met. 23, 43 (1971).
194. L. Vanderbuckle, J. Less-Common Met. 82, 49 (1981).
195. K. Ploog, J. Cryst. Growth, 197 (1974).
196. U. Jansson, Thin Solid Films 124, 101 (1985).
197. K. Wasa, Thin Solid Films 31, 235 (1976).
198. Y. Hirohata, Thin Solid Films 63, 237 (1979).
199. J. Stiglich Thin Solid Films 72, 503 (1980).
200. Numerical Data and Functional Relationships in Science and Technology, edited by O. Madelund, M. Schulz, and H. Weiss, Landolt-Bornstein, New Series, Vol. 17 (Springer-Verlag, Berlin, 1984), p. 404.
201. J. Chin, Thin Solid Films 40, 57 (1977).
202. H. Yoshihara, Thin Solid Films 76, 1 (1981).
203. K. E. Haq, Appl. Phys. Lett. 26, 255 (1975).
204. S. Nishino, Thin Solid Films 40, 27 (1977).
205. R. Brutsch, Thin Solid Films 126, 313 (1985).
206. Y. Murayama, Thin Solid Films 40, 309 (1977).
207. A. L. Dragoo, J. Am. Ceram. Soc. 11, 50 (1967).
208. R. F. Bunshah, Thin Solid Films 40, 211 (1977).
209. B. Lux, Thin Solid Films 138, 49 (1986).
210. R. W. Knoll Thin Solid Films 177, 201 (1984).
211. S. Schiller, Thin Solid Films 63, 369 (1979).
212. E. Ryshkewitch, Oxide Ceramics (Academic, New York, 1960).
213. S. Ekmar, Soc. Manufact. Eng. 77, 201 (1977).
214. C. Chatfield, Thin Solid Films (in press).
215. H. Schachner, Proceedings of the 5th International Conference on Chemical Vapor Deposition (Electrochemi-cal Society, Buckinghamshire, G. B., 1975), p. 485.
216. J. J. Oaks, Thin Solid Films 107, 159 (1983).
217. R. C. Garvie, in High Temperature Oxides, Part II, edited by A. M. Alper (Academic, New York, 1970), p. 118.
218. H. O. Pierson, J. Less-Common Met. 67, 381 (1979).
219. P. Peshev, J. Less-Common Met. 67, 351 (1979).
220. A. J. Becker Thin Solid Films 119, 241 (1984).
221. G. Bliznakov, J. Less-Common Met. 67, 511 (1979).
222. H. O. Pierson, Thin Solid Films 54, 119 (1978).
223. K. R. Padmanabhan, Thin Solid Films 81, 13 (1983).
224. J. J. Gehart, J. Am. Ceram. Soc. 48, 262 (1964).
225. E. Randich, Thin Solid Films 63, 309 (1979).
226. B. Armas, J. Electrochem. Soc. 123, 308 (1976).
227. H. O. Piersson, Thin Solid Films 40, 41 (1977).
228. B. E. Jacobsson, Thin Solid Films 118, 285 (1984).
229. H. Fark, J. Chevallier, K. Reichelt, H. Dimigen, and H. Hiibsch, Thin Solid Films 100, 193 (1983).
230. R. Nimmagadda Thin Solid Films 45, 447 (1977).
231. G. Wahl, Thin Solid Films 107, 417 (1983).
232. F. Sarkisyan, Am. Ind. Tech. Econ. Bull. 3–4, 71 (1968).
233. V. S. Kovalchuk, Sov. Powder Metall. Met. Ceram. 14, 175 (1975).
234. H. T. G. Nilsson, Thin Solid Films 45, 463 (1977).
235. K. A. B. Andersson, Proceedings of the 7th International Vacuum Congress and the 3rd International Conference on Solid Surfaces, edited by R. Dobrozemsky, F. Riidenauer, F. P. Viebock, and A. Breth (Berger and Sohne, Vienna, 1977)
236. N. Ohmae, J. Lub. Technol. 100, 129 (1978).
237. B. A. Movchan, Thin Solid Films 107, 417 (1983).
238. J. A. Thornton, Thin Solid Films 40, 365 (1977).
239. C. Weissmantel, Thin Solid Films 72, 19 (1980).
240. S. Aisenberg, J. Appl. Phys. 42, 2953 (1971).
241. E. G. Spencer, Appl. Phys. Lett. 29, 118 (1976).
242. L. P. Andersson, Thin Solid Films 63, 155 (1979).
243. S. Berg, Thin Solid Films 58, 117 (1979).
244. D. S. Whitmella, Thin Solid Films 35, 255 (1979).
245. S. M. Ojha, Thin Solid Films 38, 7 (1976).
246. S. M. Ojha Thin Solid Films 40, 31 (1977).
247. H. Vora, J. Appl. Phys. 52, 6151 (1981).
248. M. P. Nadler, Appl. Surf. Sci. 18, 10 (1984).
249. J. C. Angus, Thin Solid Films 118, 3111 (1984).
250. S. M. Ojha, Thin Solid Films 60, 213 (1979).
251. K. Enke, Thin Solid Films 80, 227 (1981).
252. N. R. S. Tait, Nucl. Instrum. Method 176, 433 (1980).
253. D. Nir, Thin Solid Films 117, 125 (1984).
254. M. P. Nadler, Thin Solid Films 116, 241 (1983).
255. J. Flink, Solid State Commun. 47, 687 (1983).
256. C. Weismantel, Surf. Sci. 86, 207 (1979).
257. C. Weismantel, Thin Solid Films (1979).
258. C. Weissmantel, review talk given at the 6th International Conference on Thin Films, Stockholm, August 1984.
259. C. Weissmantel, Thin Solid Films 61, 5 (1979).
260. D. Nir, Thin Solid Films 112, 41 (1984).
261. J. Zelez, J. Vac. Sci. Technol. 1, 305 (1983).