Deposition process and characterization of chromium-carbon coatings produced by direct sputtering of a magnetron chromium carbide target

Journal of Materials Research

Volumn 9, Issue 7, 1994, Pages 1820-1828

  Marechal, N ^a   Quesnel, E ^a   Pauleau, Y ^a  

^a Nuclear Research Center of Grenoble ^*  (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; COMPOSITION; DEPOSITION; SCANNING ELECTRON MICROSCOPY; SPUTTERING;

MICROHARDNESS; RUTHERFORD BACKSCATTERING; SELF BIAS VOLTAGE;

COATINGS;

EID: 0028466354     PISSN: 08842914     EISSN: 20445326     Source Type: Journal    
DOI: 10.1557/JMR.1994.1820     Document Type: Article

References (15)

1. H. Dimigen and H. Hiibsch, Philips Tech. Rev. 41 (6), 186 (1983/84).
2. H. Dimigen and H. Hiibsch, U.S. Patent, 4525 417, June 25 (1985).
3. E. Bergmann and J. Vogel, J. Vac. Sci. Technol. A4 (6), 2867 (1986).
4. Y. Pauleau and P.H. Gouy-Pailler, Mater. Lett. 13, 157 (1992).
5. Y. Pauleau and P.H. Gouy-Pailler, J. Mater. Res. 7, 2070 (1992).
6. Y. Pauleau, P.H. Gouy-Pailler, and S. Pa’fdassi, Surf. Coat. Technol. 54/55, 324 (1992).
7. A. Aubert, J. Danroc, A. Gaucher, and J. P. Terrat, Thin Solid Films 126, 61 (1985).
8. S. K. Sharma and J. P. Morlevat, Thin Solid Films 156 (2), 307 (1988).
9. E. Bouzy, G. Le Caer, and E. Bauer-Grosse, Mater. Sci. Eng. A133, 640 (1991).
10. G. Cholvy and J.L. Derep, J. Vac. Sci. Technol. A3 (6), 2378 (1985).
11. G. Cholvy, J. L. Derep, and M. Gantois, Thin Solid Films 126 (1–2), 51 (1985).
12. V. Agarwal, V. D. Vankar, and K. L. Chopra, Thin Solid Films 169 (2), 281 (1989).
13. S.N. L’vov, V. F. Nemchenko, and G. V. Samsonov, Sov. Phys. Dokl. 5 (6), 1334 (1961).
14. B. Jonsson and S. Hogmark, Thin Solid Films 114, 257 (1984).
15. J.A. Thornton and D.W. Hoffman, Thin Solid Films 171, 5 (1989).