The electrodeposition and properties of amorphous chromium films prepared from chromic acid solutions

Journal of the Electrochemical Society

Volumn 133, Issue 4, 1986, Pages 681-685

  Hoflund, Gar B ^b  

^a TOKYO CITY UNIVERSITY   (Japan)

^b UNIVERSITY OF FLORIDA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACIDS - APPLICATIONS; ELECTROPLATING - APPLICATIONS; FILMS - METALLIC; FORMALDEHYDE - APPLICATIONS; ORGANIC COMPOUNDS;

CHROMIC ACID; CHROMIUM CRYSTALLITES; FORMAMIDE;

CHROMIUM AND ALLOYS;

EID: 0022695256     PISSN: 00134651     EISSN: 19457111     Source Type: Journal    
DOI: 10.1149/1.2108653     Document Type: Article

References (9)

1. G. J. Sargent, Trans. Am. Electrochem.Soc., 37, 479 (1920)
2. C. G. Fink, U.S. Pat. 1, 581, 188 (1926).
3. J. C. Crowther and A. Renton, Electroplat. Met. Finish., 28, 6 (1975).
4. S. Hoshino, Unpublished results.
5. H. Furuya, Y. Misaki, and Y. Tanabe, J. Met. Finish. Soc. Jpn., 32, 631 (1981).
6. T. Morikawa and S. Eguchi, Extended Abstracts, 70th Annual Conference of the Metal Finishing Society of Japan, 1984.
7. A. M. Kasaaian and J. Dash, Plating Surf. Finish., 71, 66 (1984).
8. G. B. Hoflund, D. A. Asbury, S. J. Babb, A. L. Grogan, Jr., H. A. Laitinen, and S. Hoshino, J. Vac. Sci. Technol., 4, 26 (1986).
9. G. B. Hoflund, D. A. Asbury, H. A. Laitinen, and S. Hoshino, To be published.