Selection of metalorganic precursors for MOCVD of metallurgical coatings: Application to Cr-based coatings

Surface and Coatings Technology

Volumn 86-87, Issue PART 1, 1996, Pages 316-324

  Maury, F ^a   Gueroudji, L ^a   Vahlas, C ^a  

^a CNRS   (France)

Author keywords

Cr based coating; Metalorganic precursor; Mocvd

Indexed keywords

CHROMIUM COMPOUNDS; FILM GROWTH; LOW TEMPERATURE OPERATIONS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; METALLURGY; ORGANOMETALLICS; THIN FILMS;

LOW TEMPERATURE DEPOSITION; METALLOID INCORPORATION; METALLURGICAL COATINGS;

PROTECTIVE COATINGS;

EID: 0030381671     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(96)03045-9     Document Type: Article

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