Applications of wear-resistant thick films formed by physical vapor deposition processes

Thin Solid Films

Volumn 40, Issue C, 1977, Pages 155-167

  Nakamura, Kazuo ^a   Inagawa, Konosuke ^a   Tsuruoka, Kazuyuki ^a   Komiya, Souji ^a  

^a ULVAC INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000216852     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(77)90115-8     Document Type: Article

References (14)

1. The Effect of Substrate Temperature on the Structure of Titanium Carbide Deposited by Activated Reactive Evaporation
2. Production and Measurement of Dense Metal Ions for Physical Vapor Deposition by a Hollow Cathode Discharge
3. Thermal input to substrate during deposition by hollow−cathode discharge
4. Physical vapor deposition of thick Cr and its carbide and nitride films by hollow-cathode discharge