In situ diagnostics of methane/hydrogen plasma interactions with Si(100)

Materials Research Society Symposium - Proceedings

Volumn 569, Issue , 1999, Pages 179-184

  Duan, H L ^a   Bent, Stacey F ^a  

^a Stanford University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON CYCLOTRON RESONANCE; ETCHING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGEN; INFRARED SPECTROSCOPY; METHANE; PLASMA INTERACTIONS; SEMICONDUCTING FILMS; SEMICONDUCTOR DEVICE MANUFACTURE; SPUTTER DEPOSITION;

HYDROGEN DILUTION; IN SITU DIAGNOSTICS;

SILICON WAFERS;

EID: 0033310711     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-569-179     Document Type: Conference Paper

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