Electron cyclotron resonance plasma etching of oxides and SrS and ZnS-based electroluminescent materials for flat panel displays

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 3, 1998, Pages 1944-1948

  Lee, J W ^a   Pathangey, B ^a   Davidson, M R ^a   Holloway, P H ^a   Lambers, E S ^a   Davydov, A ^a   Anderson, T J ^a   Pearton, S J ^a  

^a University of Florida   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONDUCTIVE ELECTRODES; ELECTROLUMINESCENT MATERIALS; ELECTRON CYCLOTRON RESONANCE PLASMA; ETCH RATES; ETCHED SURFACE; INDIUM TIN OXIDE; ION DENSITY; METAL STACKS; NEAR-SURFACE; OPTIMIZED PROCESS; PLASMA CHEMISTRIES; THIN-FILM ELECTROLUMINESCENT;

CYCLOTRONS; ELECTROLUMINESCENCE; ELECTRON CYCLOTRON RESONANCE; FLAT PANEL DISPLAYS; ION SOURCES; LIGHT EMISSION; PLASMA ETCHING; RESONANCE; STOICHIOMETRY; TIN; TIN OXIDES; TITANIUM COMPOUNDS; ZINC SULFIDE;

ARGON;

EID: 2942526361     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581201     Document Type: Article

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