Impact of thermal and structural effects on EUV lithographic performance

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3331, Issue , 1998, Pages 124-132

  Ray Chaudhuri, Avijit K ^a   Gianoulakis, Steven E ^a   Spence, Paul A ^a   Kanouff, Michael P ^a   Moen, Christopher D ^a  

^a SANDIA NATIONAL LABORATORIES   (United States)

Author keywords

EUV lithography; Finite element analysis; Lithographic analysis; Multilayer film stress; Thermal loading

Indexed keywords

COMPRESSIVE STRESS; DEFORMATION; FINITE ELEMENT METHOD; MULTILAYERS; RADIATION EFFECTS; THERMAL EFFECTS; THERMOMECHANICAL TREATMENT; ULTRAVIOLET RADIATION;

STRUCTURAL EFFECTS;

PHOTOLITHOGRAPHY;

EID: 0032402520     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.309564     Document Type: Conference Paper

References (3)

1. Four-mirror ring-field system for EUV projection lithography