Precision optical aspheres for extreme ultraviolet lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 3706-3708

  Kania, D R ^a   Gaines, D P ^a   Sweeney, D S ^a   Sommargren, G E ^a   La Fontaine, B ^a   Vernon, S P ^a   Tichenor, D A ^b   Bjorkholm, J E ^b,d   Zernike, F ^b   Kestner, R N ^c  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

^c Tinsley Laboratories   (United States)

^d INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPHERICS; DIFFRACTION; IMAGING SYSTEMS; INTERFEROMETERS; MULTILAYERS; OPTICAL DEVICES; REFLECTION; SURFACE ROUGHNESS; ULTRAVIOLET SPECTROSCOPY; WAVEFRONTS;

NEAR DIFFRACTION LIMITED IMAGING; PHASE SHIFTING POINT DIFFRACTION INTERFEROMETER; REFLECTIVITY;

PHOTOLITHOGRAPHY;

EID: 0030284208     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588652     Document Type: Article

References (8)

1. D. G. Stearns, R. S. Rosen, and S. P. Vernon, Appl. Opt. 32, 6952 (1993).
2. E. L. O'Neill, Introduction to Statistical Optics (Dover, New York, 1991), pp. 86-89.
3. G. E. Sommargren, OSA Topical Meeting on EUVL, edited by D. R. Kania and G. Kubiak (Optical Society of America, Washington, DC, 1996).
4. S. P. Vernon and S. L. Baker, OSA Proceedings on Extreme Ultraviolet Lithography, edited by F. Zernike and D. T. Attwood (1994), Vol. 23, pp. 222-226.
5. J. H. Bruning, A. R. Phillips, D. R. Shafer, and A. D. White, U.S. Patent 5,220,590 (1992).
6. Tinsley Laboratories, 3900 Lakeside Drive, Richmond, CA 94806.
7. R. Kestner, OSA Proceedings on Extreme Ultraviolet Lithography, edited by D. R. Kania and G. Kubiak (Optical Society of America, Washington, DC, 1996).
8. D. G. Stearns et al., Proceedings on Extreme Ultraviolet Lithography, edited by D. R. Kania and G. Kubiak (Optical Society of America, Washington, DC, 1996).