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Volumn 46, Issue 4, 1999, Pages 981-992

Residual stress in sputtered gold films on quartz measured by the cantilever beam deflection technique

Author keywords

[No Author keywords available]

Indexed keywords

COMPRESSIVE STRESS; ELECTRODES; GOLD; MORPHOLOGY; QUARTZ APPLICATIONS; RESIDUAL STRESSES; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING FILMS; SPUTTERING; STRESS RELAXATION; TENSILE STRESS; TRANSMISSION ELECTRON MICROSCOPY;

EID: 0032643990     PISSN: 08853010     EISSN: None     Source Type: Journal    
DOI: 10.1109/58.775665     Document Type: Article
Times cited : (12)

References (26)
  • 6
    • 0016436562 scopus 로고    scopus 로고
    • voltage sputtered tungsten films, J. Appt. Phys., vol. 46, no. 1, pp. 112-117. Jan. 1975.
    • R. C. Sun, T. 0. Tisone, and P. D. CruzanThe origin of internal stress in low-voltage sputtered tungsten films, J. Appt. Phys., vol. 46, no. 1, pp. 112-117. Jan. 1975.
    • The Origin of Internal Stress in Low
    • Sun, R.C.1    Tisone, T.2    Cruzan, P.D.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.