Internal stresses in metallic films deposited by cylindrical magnetron sputtering

Thin Solid Films

Volumn 64, Issue 1, 1979, Pages 111-119

  Thornton, John A ^a   Tabock, Jack ^b   Hoffman, D W ^b  

^a Telic Corporation ^*  (United States)

^b FORD MOTOR COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM AND ALLOYS; GADOLINIUM AND ALLOYS; METALS AND ALLOYS - SPUTTERING; NICKEL AND ALLOYS; RHODIUM AND ALLOYS;

INTERNAL STRESSES; MAGNETRON SPUTTERING;

FILMS;

EID: 0018806784     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(79)90550-9     Document Type: Article

References (20)

1. Internal stresses in titanium, nickel, molybdenum, and tantalum films deposited by cylindrical magnetron sputtering
2. Ion reflection from a single crystal